Microwave Plasma Sources and Methods in Processing Technology
Ladislav Bárdoš and Hana Baránková
Uppsala University, Uppsala, Sweden
This edition first published 2022
Copyright © 2022 by The Institute of Electrical and Electronics Engineers, Inc. All rights reserved.
Published by John Wiley & Sons, Inc., Hoboken, New Jersey.
Published simultaneously in Canada.
No part of this publication may be reproduced, stored in a retrieval system, or transmitted in any form or by any means, electronic, mechanical, photocopying, recording, scanning, or otherwise, except as permitted under Section 107 or 108 of the 1976 United States Copyright Act, without either the prior written permission of the Publisher, or authorization through payment of the appropriate per-copy fee to the Copyright Clearance Center, Inc., 222 Rosewood Drive, Danvers, MA 01923, (978) 750-8400, fax (978) 750-4470, or on the web at www.copyright.com. Requests to the Publisher for permission should be addressed to the Permissions Department, John Wiley & Sons, Inc., 111 River Street, Hoboken, NJ 07030, (201) 748-6011, fax (201) 748-6008, or online at http://www.wiley.com/go/permission.
Limit of Liability/Disclaimer of Warranty: While the publisher and author have used their best efforts in preparing this book, they make no representations or warranties with respect to the accuracy or completeness of the contents of this book and specifically disclaim any implied warranties of merchantability or fitness for a particular purpose. No warranty may be created or extended by sales representatives or written sales materials. The advice and strategies contained herein may not be suitable for your situation. You should consult with a professional where appropriate. Neither the publisher nor author shall be liable for any loss of profit or any other commercial damages, including but not limited to special, incidental, consequential, or other damages.
For general information on our other products and services or for technical support, please contact our Customer Care Department within the United States at (800) 762-2974, outside the United States at (317) 572-3993 or fax (317) 572-4002.
Wiley also publishes its books in a variety of electronic formats. Some content that appears in print may not be available in electronic formats. For more information about Wiley products, visit our web site at www.wiley.com.
Library of Congress Cataloging-in-Publication Data
Names: Bardos, Ladislav, 1947- author. | Barankova, Hana, 1951- author.
Title: Microwave plasma sources and methods in processing technology / Ladislav Bardos, Hana Barankova, Uppsala University, Uppsala, Sweden.
Description: Hoboken, New Jersey : John Wiley & Sons, 2022. | Includes bibliographical references and index.
Identifiers: LCCN 2021031913 (print) | LCCN 2021031914 (ebook) | ISBN 9781119826873 (hardback) | ISBN 9781119826880 (pdf) | ISBN 9781119826897 (epub) | ISBN 9781119826903 (ebook)
Subjects: LCSH: Electromagnetism.
Classification: LCC QC760 .B267 2022 (print) | LCC QC760 (ebook) | DDC 660/.044--dc23
LC record available at https://lccn.loc.gov/2021031913LC ebook record available at https://lccn.loc.gov/2021031914
Cover image: © Image courtesy of the authors
Cover design by Wiley
Set in 9.5/12.5pt STIXTwo Text by Integra Software Services, Pondicherry, India
1 Cover
2 Title page Microwave Plasma Sources and Methods in Processing Technology Ladislav Bárdoš and Hana Baránková Uppsala University, Uppsala, Sweden
3 Copyright
4 Foreword from the Authors
5 1 Basic Principles and Components in the Microwave Techniques and Power Systems 1.1 History in Brief – From Alternating Current to Electromagnetic Waves and to Microwaves1.2 Microwave Generators1.3 Waveguides and Electromagnetic Modes in Wave Propagation1.3.1 The Cut-off Frequency and the Wavelength in Waveguides1.3.2 Waveguides Filled by Dielectrics1.3.3 Wave Impedance and Standing Waves in Waveguides1.3.4 Coaxial Transmission Lines1.3.5 Microwave Resonators1.4 Waveguide Power Lines1.4.1 Magnetron Tube Microwave Generator1.4.2 Microwave Insulators1.4.3 Impedance Tuners1.4.4 Directional Couplers1.4.5 Passive Waveguide Components – Bends, Flanges, Vacuum Windows1.4.6 Tapered Waveguides and Waveguide Transformers1.4.7 Power Loads and Load Tuners1.4.8 Waveguide Phase Shifters1.4.9 Waveguide Shorting Plungers1.4.10 Coupling from Rectangular to Circular Waveguide: Resonant Cavities for Generation of Plasma1.5 Microwave Oven – A Most Common Microwave Power DeviceReferences
6 2 Gas Discharge Plasmas 2.1 Basic Understanding of the Gas Discharge Plasmas2.2 Generation of the Plasma, Townsend Coefficients, Paschen Curve2.3 Generation of the Plasma by AC Power, Plasma Frequency, Cut-off Density2.4 Space-charge Sheaths at Different Frequencies of the Incident Power2.5 Classification of Gas Discharge Plasmas, Effects of Gas Pressure, Microwave Generation of Plasmas2.5.1 Classification of Gas Discharge Plasmas2.5.2 Effects of the Gas Pressure on Particle Collisions in the Plasma2.5.3 Microwave Generation of PlasmasReferences
7 3 Interactions of Plasmas with Solids and Gases 3.1 Plasma Processing, PVD, and PE CVD3.2 Sputtering, Evaporation, Dry Etching, Cleaning, and Oxidation of Surfaces3.3 Particle Transport in Plasma Processing and Effects of Gas Pressure3.3.1 Movements of Neutral Particles3.3.2 Movements of Charged Particles3.3 Effect of the Gas Pressure on the Plasma Processing3.4 Afterglow and Decaying Plasma ProcessingReferences
8 4 Microwave Plasma Systems for Plasma Processing at Reduced Pressures 4.1 Waveguide-Generated Isotropic and Magnetoactive Microwave Plasmas4.1.1 Waveguide-Generated Isotropic Microwave Oxygen Plasma for Silicon Oxidation4.1.2 ECR and Higher Induction Magnetized Plasma Systems for Silicon Oxidation4.2 PE CVD of Silicon Nitride Films in the Far Afterglow4.3 Microwave Plasma Jets for PE CVD of Films4.3.1 Deposition of Carbon Nitride Films4.3.2 Surfajet Plasma Parameters and an Arrangement for Expanding the Plasma Diameter4.4 Hybrid Microwave Plasma System with Magnetized Hollow CathodeReferences
9 5 Microwave Plasma Systems at Atmospheric and Higher Pressures 5.1 Features of the Atmospheric Plasma and Cold Atmospheric Plasma(CAP) Sources5.2 Atmospheric Microwave Plasma Sources Assisted by Hollow Cathodes5.2.1 Applications of the H-HEAD Plasma Source in Surface Treatments5.3 Microwave Treatment of Diesel Exhaust5.4 Microwave Plasma in Liquids5.5 Microwave Plasma Interactions with Flames5.6 Microwave Plasmas at Very High PressuresReferences
10 6 New Applications and Trends in the Microwave Plasmas References
11 7 Appendices 7.1 List of Symbols and Abbreviations7.2 Constants and Numbers
12 Index
13 End User License Agreement
1 Chapter 1Figure 1.1 Graphical illustration of the frequencies and wavelengths...Figure 1.2 Construction of the magnetron tube consists of the anode...Figure 1.3 The electric and magnetic fields in the waveguides...Figure 1.4 Schematic description of the reflection of...Figure 1.5 Formation of the standing waves by waves moving in the waveguide...Figure 1.6 Typical construction of coaxial cables...Figure 1.7 Principle of construction of an air-filled coaxial line with possible...Figure 1.8 Examples of coupling arrangements.
Читать дальше